NI Improves PXI SMU Channel Density for the STS by 6X

NI announced the PXIe-4163 high-density source measure unit (SMU), which provides six times more DC channel density than previous NI PXI SMUs for testing RF, MEMS, and mixed-signal and other analog semiconductor components.

Chipmakers have rapidly adopted the Semiconductor Test System (STS) for its throughput, performance at cost and footprint on the production floor. The new PXIe-4163 SMU further complements these capabilities. It delivers increased DC channel density for higher parallelism in multisite applications and lab-grade measurement quality in a production-ready form factor. Engineers can take advantage of this combination to use the same instrumentation in the validation lab and the production floor, which reduces challenges with measurement correlation and shortens time to market.

Engineers can use the new PXIe-4163 SMU in either STS configurations or stand-alone PXI systems. Key product features include up to 24 channels in a single PXI Express slot, ±24 V per channel, up to 100 mA source/sink per channel, 100 pA current sensitivity, up to 100 kS/s sampling rate and update rate, or SourceAdapt for minimizing overshoot and oscillations.

To learn more about STS capabilities, visit www.ni.com/sts/.